Claims for Patent: 11,542,239
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Summary for Patent: 11,542,239
| Title: | Elagolix sodium compositions and processes |
| Abstract: | The present invention relates to compositions of elagolix sodium, and process and intermediates for the preparation thereof. |
| Inventor(s): | Niharika Chauhan, Raimundo HO, Albert Kruger, Samrat MUKHERJEE, Stephen T. Chau, Erika Crane, Alex Fabian, Sanjay Chemburkar, Travis Dunn |
| Assignee: | AbbVie Inc |
| Application Number: | US16/519,443 |
| Patent Claims: |
1. A composition comprising: Compound (I), and one or more impurity selected from a group consisting of: wherein Compound (I) comprises at least 97 weight percent of the composition and wherein the one or more impurity is present in an amount that is greater than zero and equal to or less than 3 weight percent of the composition. 2. The composition of claim 1, wherein the composition further comprises one or more additional impurities, wherein the one or more additional impurities are selected from the group consisting of: 3. The composition of claim 1, wherein Compound (I) is substantially amorphous. 4. The composition of claim 1, wherein the composition comprises at least 98 weight percent Compound (I) and wherein the one or more impurity is present in an amount that is greater than zero and equal to or less than 2 weight percent of the composition. 5. A composition comprising, Compound (I), and one or more impurity selected from a group consisting of: wherein the composition comprises at least about 97 weight percent of Compound (I), and wherein the one or more impurity is present in an amount that is greater than zero and equal to or less than 3 weight percent of the composition, and further wherein the composition is prepared by a process comprising, using as an intermediate, Compound (II), 6. The composition of claim 5, wherein the process further comprises reacting Compound (IIa), with salicylic acid to form Compound (II). 7. The composition of claim 6, wherein the process further comprises isolating Compound (II) to provide an isolated Compound (II). 8. The composition of claim 5, wherein the composition further comprises one or more additional impurities, wherein the one or more additional impurities are selected from the group consisting of: 9. A composition comprising: Compound (I) and one or more impurity selected from a group consisting of: ethyl 4-[(4R)-2-oxo-4-phenyl-1,2λ4,3-oxathiazolidin-3-yl]butanoate; ethyl 4-[(4R)-2,2-dioxo-4-phenyl-1,2λ6,3-oxathiazolidin-3-yl]butanoate; and (4-ethoxy-4-oxobutyl){(1R)-2-[5-(2-fluoro-3-methoxyphenyl)-3-{[2-fluoro-6-(trifluoromethyl)phenyl]methyl}-4-methyl-2,6-dioxo-3,6-dihydropyrimidin-1-(2H)-yl]-1-phenylethyl}sulfamic acid or a salt thereof, wherein the composition comprises at least about 97 weight percent of Compound (I); and wherein the one or more impurity is present in an amount that is greater than zero and equal to or less than 3 weight percent of the composition, and further wherein the composition is prepared by a process comprising, using as an intermediate, Compound (VIa), 10. The composition of claim 9, wherein the composition further comprises one or more additional impurities, wherein the one or more additional impurities are selected from the group consisting of: 11. A composition comprising, Compound (I), and one or more impurity a second compound selected from a group consisting of: wherein the composition comprises at least about 97 weight percent of Compound (I) and wherein the one or more impurity is present in an amount that is greater than zero and equal to or less than 3 weight percent of the composition. 12. The composition of claim 1, wherein the composition further comprises one additional impurity, wherein the one additional impurity is: 13. The composition of claim 5, wherein the composition further comprises one additional impurity, wherein the one additional impurity is: 14. The composition of claim 9, wherein the composition further comprises one additional impurity, wherein the one additional impurity is: 15. The composition of claim 1, wherein the one or more impurity comprises Compound (iii) the composition comprises at least 97 weight percent of Compound (I) and not more than 0.25 weight percent Compound (iii). 16. The composition of claim 1, wherein the one or more impurity comprises Compound (v) the composition comprises at least 97 weight percent of Compound (I) and not more than 0.55 weight percent Compound (v). 17. The composition of claim 1, wherein the one or more impurity comprises Compound (vi) the composition comprises at least 97 weight percent of Compound (I) and not more than 0.40 weight percent Compound (vi). 18. The composition of claim 1, wherein the one or more impurity comprises Compound (vii) the composition comprises at least 97 weight percent of Compound (I) and not more than 0.35 weight percent Compound (vii). 19. The composition of claim 11, wherein the one or more impurity comprises Compound (x) the composition comprises at least 97 weight percent of Compound (I) and not more than 25 parts per million (ppm) Compound (x). 20. The composition of claim 11, wherein the one or more impurity comprises Compound (xv) the composition comprises at least 97 weight percent of Compound (I) and not more than 0.6 parts per million (ppm) Compound (xv). 21. The composition of claim 11, wherein the one or more impurity comprises Compound (xvi) the composition comprises at least 97 weight percent of Compound (I) and not more than 0.9 parts per million (ppm) Compound (xvi). 22. The composition of claim 11, wherein the one or more impurity comprises Compound (xvii) the composition comprises at least 97 weight percent of Compound (I) and not more than 2.5 parts per million (ppm) Compound (xvii). |
