Details for Patent: 6,036,976

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Summary for Patent: 6,036,976

Title:	Sustained release microspheres and preparation thereof
Abstract:	Disclosed is a method of producing microspheres which comprises subjecting a w/o/w emulsion or o/w emulsion to an in-water drying method under the following conditions: 1) the amount of microspheres per m.sup.3 of an external aqueous phase is about 0.1 to about 500 kg, 2) the square root of the area (unit: m.sup.2) of the liquid surface in contact with the gas phase is about 0.2 to about 4.5 per the cube root of the volume (unit: m.sup.3) of an external aqueous phase, 3) the w/o/w emulsion or o/w emulsion is replaced at the replacement frequency of about 0.01 to about 10 times/minutes, 4) a gas is blown to the w/o/w emulsion or o/w emulsion at the gas transfer rate near the liquid surface of about 0.1 to about 300 m/second, and 5) the gas is replaced at the replacement frequency of not less than about 0.5 times/minutes; and the method of the present invention increases the rate of solvent removal from microspheres in in-water drying, reduces the amount of solvent in microspheres in a short time.
Inventor(s):	Takechi; Nobuyuki (Osaka, JP), Ohtani; Seiji (Osaka, JP), Nagai; Akihiro (Osaka, JP)
Assignee:	Takeda Chemical Industries, Ltd. (Osaka, JP)
Application Number:	09/154,164
Patent Claim Types: see list of patent claims	Process; Delivery; Composition; Compound;

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