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Last Updated: December 14, 2024

Details for Patent: 6,245,911


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Summary for Patent: 6,245,911
Scope and claims summary:
Title: Donepezil polycrystals and process for producing the same
Abstract:The present invention provides novel polymorphic crystals (A) to (C) having excellent handling properties and an extremely low content of residual solvent of donepezil used as a precursor for production of donepezil hydrochloride having an excellent action as a medicament, and an industrial process for producing the same. Further, the novel polymorphic crystals (A) to (C) according to the present invention are characterized by the powder X-ray diffraction pattern and/or IR absorption peaks of donepezil represented by the following formula: ##STR1##
Inventor(s): Imai; Akio (Ibaraki, JP), Ichinohe; Toshiyuki (Ibaraki, JP), Endo; Takashi (Ibaraki, JP), Tsurugi; Tomio (Ibaraki, JP), Uemura; Makoto (Ibaraki, JP)
Assignee: Eisai Co., Ltd. (Tokyo, JP)
Application Number:09/555,807
Patent Claim Types:
see list of patent claims
Compound; Process;

Drugs Protected by US Patent 6,245,911

Applicant Tradename Generic Name Dosage NDA Approval Date TE Type RLD RS Patent No. Patent Expiration Product Substance Delist Req. Patented / Exclusive Use Submissiondate
>Applicant >Tradename >Generic Name >Dosage >NDA >Approval Date >TE >Type >RLD >RS >Patent No. >Patent Expiration >Product >Substance >Delist Req. >Patented / Exclusive Use >Submissiondate

Foreign Priority and PCT Information for Patent: 6,245,911

Foriegn Application Priority Data
Foreign Country Foreign Patent Number Foreign Patent Date
Japan9-336165Dec 05, 1997
PCT Information
PCT FiledDecember 01, 1998PCT Application Number:PCT/JP98/05405
PCT Publication Date:June 17, 1999PCT Publication Number: WO99/29668

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