Details for Patent: 8,993,761

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Summary for Patent: 8,993,761

Title:	Low hygroscopic aripiprazole drug substance and processes for the preparation thereof
Abstract:	The present invention provides low hygroscopic forms of aripiprazole and processes for the preparation thereof which will not convert to a hydrate or lose their original solubility even when a medicinal preparation containing the anhydrous aripiprazole crystals is stored for an extended period.
Inventor(s):	Bando; Takuji (Tokushima, JP), Aoki; Satoshi (Tokushima, JP), Kawasaki; Junichi (Tokushima, JP), Ishigami; Makoto (Tokushima, JP), Taniguchi; Youichi (Tokushima, JP), Yabuuchi; Tsuyoshi (Tokushima, JP), Fujimoto; Kiyoshi (Tokushima, JP), Nishioka; Yoshihiro (Tokushima, JP), Kobayashi; Noriyuki (Tokushima, JP), Fujimura; Tsutomu (Tokushima, JP), Takahashi; Masanori (Tokushima, JP), Abe; Kaoru (Tokushima, JP), Nakagawa; Tomonori (Tokushima, JP), Shinhama; Koichi (Tokushima, JP), Utsumi; Naoto (Tokushima, JP), Tominaga; Michiaki (Tokushima, JP), Ooi; Yoshihiro (Tokushima, JP), Yamada; Shohei (Toksuhima, JP), Tomikawa; Kenji (Tokushima, JP)
Assignee:	Otsuka Pharamceutical Co. Ltd. (Tokyo, JP)
Application Number:	13/749,753
Patent Claim Types: see list of patent claims	Formulation; Process;

Drugs Protected by US Patent 8,993,761

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Applicant	Tradename	Generic Name	Dosage	NDA	Approval Date	TE	Type	RLD	RS	Patent No.	Patent Expiration	Product	Substance	Delist Req.	Patented / Exclusive Use	Submissiondate
>Applicant	>Tradename	>Generic Name	>Dosage	>NDA	>Approval Date	>TE	>Type	>RLD	>RS	>Patent No.	>Patent Expiration	>Product	>Substance	>Delist Req.	>Patented / Exclusive Use	>Submissiondate

Foreign Priority and PCT Information for Patent: 8,993,761

Foriegn Application Priority Data
Foreign Country	Foreign Patent Number	Foreign Patent Date
Japan	2001-290645	Sep 25, 2001
Japan	2001-348276	Nov 14, 2001
Canada	2379005	Mar 27, 2002

International Family Members for US Patent 8,993,761

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