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Last Updated: December 24, 2024

Details for Patent: 10,517,951


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Summary for Patent: 10,517,951
Patent landscape, scope, and claims:
Title:Injectable preparation
Abstract:An object of the present invention is to provide a storage-stable injectable preparation comprising a composition comprising a poorly soluble drug as an active ingredient and a dispersion medium. Another object of the present invention is to provide a compact, lightweight prefilled syringe by filling a syringe with the injectable preparation. The present invention provides an injectable preparation comprising a composition comprising a poorly soluble drug, a dispersion medium, and a specific suspending agent, the composition having a viscosity of 40 pascal-seconds or more in at least one point in the shear rate range of 0.01 to 0.02 sand having a viscosity of 0.2 pascal-seconds or less in at least one point in the shear rate range of 900 to 1,000 s, as measured.
Inventor(s):Kaneko Daiki, Matsuda Takakuni, Hoshika Yusuke
Assignee:OTSUKA PHARMACEUTICAL CO., LTD.
Application Number:US16156958
Patent Claim Types:
see list of patent claims
 

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Drugs Protected by US Patent 10,517,951

Applicant Tradename Generic Name Dosage NDA Approval Date TE Type RLD RS Patent No. Patent Expiration Product Substance Delist Req. Patented / Exclusive Use Submissiondate
Otsuka ABILIFY ASIMTUFII aripiprazole SUSPENSION, EXTENDED RELEASE;INTRAMUSCULAR 217006-001 Apr 27, 2023 RX Yes No 10,517,951 ⤷  Subscribe Y MAINTENANCE MONOTHERAPY TREATMENT OF BIPOLAR I DISORDER ⤷  Subscribe
Otsuka ABILIFY ASIMTUFII aripiprazole SUSPENSION, EXTENDED RELEASE;INTRAMUSCULAR 217006-001 Apr 27, 2023 RX Yes No 10,517,951 ⤷  Subscribe Y TREATMENT OF SCHIZOPHRENIA ⤷  Subscribe
Otsuka ABILIFY ASIMTUFII aripiprazole SUSPENSION, EXTENDED RELEASE;INTRAMUSCULAR 217006-002 Apr 27, 2023 RX Yes Yes 10,517,951 ⤷  Subscribe Y TREATMENT OF SCHIZOPHRENIA ⤷  Subscribe
>Applicant >Tradename >Generic Name >Dosage >NDA >Approval Date >TE >Type >RLD >RS >Patent No. >Patent Expiration >Product >Substance >Delist Req. >Patented / Exclusive Use >Submissiondate

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