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Last Updated: November 23, 2024

Details for Patent: 8,642,760


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Summary for Patent: 8,642,760
Title:Low hygroscopic aripiprazole drug substance and processes for the preparation thereof
Abstract: The present invention provides low hygroscopic forms of aripiprazole and processes for the preparation thereof which will not convert to a hydrate or lose their original solubility even when a medicinal preparation containing the anhydrous Aripiprazole crystals is stored for an extended period.
Inventor(s): Bando; Takuji (Tokushima, JP), Aoki; Satoshi (Naruto, JP), Kawasaki; Junichi (Tokushima, JP), Ishigami; Makoto (Tokushima, JP), Taniguchi; Youichi (Tokushima, JP), Yabuuchi; Tsuyoshi (Tokushima, JP), Fujimoto; Kiyoshi (Naruto, JP), Nishioka; Yoshihiro (Tokushima, JP), Kobayashi; Noriyuki (Tokushima, JP), Fujimura; Tsutomu (Naruto, JP), Takahashi; Masanori (Tokushima, JP), Abe; Kaoru (Tokushima, JP), Nakagawa; Tomonori (Tokushima, JP), Shinhama; Koichi (Tokushima, JP), Utsumi; Naoto (Naruto, JP), Tominaga; Michiaki (Tokushima, JP), Ooi; Yoshihiro (Tokushima, JP), Yamada; Shohei (Tokushima, JP), Tomikawa; Kenji (Tokushima, JP)
Assignee: Otsuka Pharmaceutical Co., Ltd. (Tokyo, JP)
Application Number:13/067,750
Patent Litigation and PTAB cases: See patent lawsuits and PTAB cases for patent 8,642,760
Patent Claim Types:
see list of patent claims
 

Drugs Protected by US Patent 8,642,760

Applicant Tradename Generic Name Dosage NDA Approval Date TE Type RLD RS Patent No. Patent Expiration Product Substance Delist Req. Patented / Exclusive Use Submissiondate
>Applicant >Tradename >Generic Name >Dosage >NDA >Approval Date >TE >Type >RLD >RS >Patent No. >Patent Expiration >Product >Substance >Delist Req. >Patented / Exclusive Use >Submissiondate

Foreign Priority and PCT Information for Patent: 8,642,760

Foriegn Application Priority Data
Foreign Country Foreign Patent Number Foreign Patent Date
Japan2001-290645Sep 25, 2001
Japan2001-348276Nov 14, 2001
Canada2379005Mar 27, 2002

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